The Plasma Theory and Modeling group are seeking a postdoctoral researcher to develop and employ models of laser-driven tin plasmas for EUV light source applications.
New-generation lithography machines employ extreme ultraviolet (EUV) radiation to print nanometer-scale features on silicon wafers for integrated circuit production. In this technology, EUV radiation is generated in a hot and dense plasma formed when intense laser radiation is focused onto liquid tin targets. A crucial aspect of EUV light source development efforts is the identification of laser parameters and target geometries which maximize EUV production in an efficient and debris-limiting manner.
The goal of this project is to develop analytical and numerical models of laser-produced tin plasmas to support EUV light source development efforts. The ultimate aim is to identify the key physical processes underlying efficient generation of EUV radiation from laser-irradiated tin targets. Using a combination of analytical models and large-scale numerical simulations, we will identify the laser configurations and target geometries which optimize EUV source operation. You will become acquainted with numerous topics in plasma physics, such as LTE/non-LTE radiation transport, laser-plasma interaction and plasma expansion. You will also work closely with experimentalists in the EUV Plasma Processes group at ARCNL, where your models will be used to interpret experimental measurements and guide future experiments.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, housing approximately 100 scientists and support staff. See also www.arcnl.nl
The Plasma Theory and Modeling group investigate the fundamental physical processes at the heart of laser-driven EUV source plasmas. Research performed by the group encompasses topics in laser-plasma interaction, atomic processes in hot plasmas, plasma expansion and laser-induced hydrodynamics of tin droplets.
You need to meet the requirements for a doctors-degree and preferably have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of laser-produced plasma modeling, atomic physics processes in dense plasmas or general plasma modeling is advantageous. Good verbal and written communication skills (in English) are required.
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Institutes Organisation of the Netherlands Organisation for Scientific Research (NWO-I) for a maximum duration of three years. ARCNL assists any new foreign postdocs with visa applications and compensates their transport costs and furnishing expenses.
Dr. John Sheil
Group leader Plasma Theory and Modeling
Phone: +31 (0)20-851 7100
You can respond to this vacancy online via the button below.
Please send your:
- Motivation on why you want to join the group (max. 1 page).
Applications without this motivation will not be taken into account. However, with this motivation your application will receive our full attention.
Online screening may be part of the selection.
Commercial response to this ad is not appreciated.
This postdoc position lies at the interface between fundamental physics and industrial application. It is part of a fully funded Dutch Top Knowledge and Innovation Covenant grant: “Determination of...
This experimental Ph.D. project aims to design next-generation plasma sources of extreme ultraviolet (EUV) light at just 13.5nm wavelength for nanolithography. Using this small wavelength light, pa...
Are you interested in simultaneously unraveling the fundamentals of friction and contributing to the solution of friction-related challenges in computer chip production? The research field of trib...
Are you interested in simultaneously unraveling the fundamentals of friction and contributing to solving friction-related challenges in computer chip production? The research field of tribology, de...
Are you interested in simultaneously unraveling the fundamentals of friction and contributing to the solution of friction-related challenges in computer chip production? The research field of tribo...
ARCNL is a new type of public-private partnership between the University of Amsterdam, the VU University Amsterdam, the NWO, and ASML.Visit the employer page