Advanced Research Center for Nanolithography ARCNL

Postdoc: Laser-propelled and -vaporized metal microdrops

Unspecified
Save as a favourite

About the employer

ARCNL is a new type of public-private partnership between the University of Amsterdam, the VU University Amsterdam, the NWO, and ASML.

Visit the employer page

The Plasma Theory and Modeling group are seeking a postdoctoral researcher to develop and employ models of laser-driven tin plasmas for EUV light source applications.

Background

New-generation lithography machines employ extreme ultraviolet (EUV) radiation to print nanometer-scale features on silicon wafers for integrated circuit production. In this technology, EUV radiation is generated in a hot and dense plasma formed when intense laser radiation is focused onto liquid tin targets. A crucial aspect of EUV light source development efforts is the identification of laser parameters and target geometries which maximize EUV production in an efficient and debris-limiting manner.

Project goal

The goal of this project is to develop analytical and numerical models of laser-produced tin plasmas to support EUV light source development efforts. The ultimate aim is to identify the key physical processes underlying efficient generation of EUV radiation from laser-irradiated tin targets. Using a combination of analytical models and large-scale numerical simulations, we will identify the laser configurations and target geometries which optimize EUV source operation. You will become acquainted with numerous topics in plasma physics, such as LTE/non-LTE radiation transport, laser-plasma interaction and plasma expansion. You will also work closely with experimentalists in the EUV Plasma Processes group at ARCNL, where your models will be used to interpret experimental measurements and guide future experiments.

About the group

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, housing approximately 100 scientists and support staff. See also www.arcnl.nl
The Plasma Theory and Modeling group investigate the fundamental physical processes at the heart of laser-driven EUV source plasmas. Research performed by the group encompasses topics in laser-plasma interaction, atomic processes in hot plasmas, plasma expansion and laser-induced hydrodynamics of tin droplets.

Qualifications

You need to meet the requirements for a doctors-degree and preferably have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of laser-produced plasma modeling, atomic physics processes in dense plasmas or general plasma modeling is advantageous. Good verbal and written communication skills (in English) are required.

Terms of employment

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Institutes Organisation of the Netherlands Organisation for Scientific Research (NWO-I) for a maximum duration of three years. ARCNL assists any new foreign postdocs with visa applications and compensates their transport costs and furnishing expenses.

Contact info

Dr. John Sheil
Group leader Plasma Theory and Modeling
E-mail: sheil@arcnl.nl 
Phone: +31 (0)20-851 7100

You can respond to this vacancy online via the button below.
Please send your: 
- Resume; 
- Motivation on why you want to join the group (max. 1 page). 
Applications without this motivation will not be taken into account. However, with this motivation your application will receive our full attention.

Online screening may be part of the selection.

Commercial response to this ad is not appreciated.

Job details

Title
Postdoc: Laser-propelled and -vaporized metal microdrops
Location
Science Park 106 Amsterdam, Netherlands
Published
2022-08-05
Application deadline
Unspecified
Job type
Save as a favourite

More jobs from this employer

About the employer

ARCNL is a new type of public-private partnership between the University of Amsterdam, the VU University Amsterdam, the NWO, and ASML.

Visit the employer page

Discover related jobs

...
Postdoctoral Research Fellow – High Fidelity Simulations and Analysis of Combustion Systems King Abdullah University of Science and Technology (KAUST) 3 years ago
...
Postdoctoral Research Fellow - Label-free imaging based on broadband Coherent Raman micro-spectroscopy King Abdullah University of Science and Technology (KAUST) 3 years ago
...
Postdoctoral fellowship position: High-Speed Laser Diagnostics in Internal Combustion Engines King Abdullah University of Science and Technology (KAUST) 2 years ago
...
Postdoctoral Researcher - Computational Fluid Dynamics King Abdullah University of Science and Technology (KAUST) 2 years ago
...
IST-BRIDGE: International Postdoctoral Program Institute of Science and Technology Austria (IST Austria) 7 months ago
...
Postdoc in Physics (Solar Cells) University of Luxembourg 6 months ago
...
Postdoctoral Fellow in Experimental Fluid Mechanics: Wave-turbulence interactions Norwegian University of Science and Technology (NTNU) 2 days ago
...
YUFE universities call for postdoctoral talent University of Antwerp 4 months ago
More jobs

Relevant stories

...
Ultrasound Isn’t Just for Babies. It Could Also Help Build a Better Computer Chip. Advanced Research Center for Nanolithography ARCNL 4 min read
...
Why Does Friction Limit Our Ability to Make Smarter Computer Chips? Advanced Research Center for Nanolithography ARCNL 5 min read
...
The Power of Ultrafast Lasers Advanced Research Center for Nanolithography ARCNL 4 min read
...
Shining a Light on Next-Generation Microchips Advanced Research Center for Nanolithography ARCNL 4 min read
...
Shining a Light on Next-Generation Microchips Advanced Research Center for Nanolithography ARCNL 4 min read
More stories