As a PhD student you will develop a 3D lensless imaging system, using coherent extreme ultraviolet radiation as the light source. You will use this system to image complex lithographic nanostructures in great detail, with both high spatial resolution and chemical sensitivity.
The ability to perform high-resolution imaging without the need for lenses provides exciting possibilities in science and technology. Lensless imaging aims to do just that: visualization of objects in phase and amplitude, by numerical image reconstruction from measured diffraction patterns. Such an approach allows high-resolution microscopy using wavelengths for which good-quality optics are challenging, such as the extreme ultraviolet (EUV).
As a PhD student, your aim is to develop a 3D lensless imaging system, using a laser-driven coherent light source at EUV wavelengths (based on high-harmonic generation). You will use this new microscope to image nanostructures at high resolution, using different wavelengths to identify material composition inside such nanostructures.
You will perform this project together a team of PhD students and postdocs in the EUV Generation and Imaging group, and collaborate with researchers from the various other research groups at ARCNL. The positions are available as part of the project 3D-VIEW, funded by an ERC Consolidator Grant.
The Advanced Research Center for Nano-Lithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nano-lithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands and currently houses approximately 90 scientists and support staff. Also see www.arcnl.nl.
The EUV Generation and Imaging group at ARCNL focuses on the development and application of advanced lensless and computational imaging technology, using radiation ranging from visible light down to soft-X-ray wavelengths, with the aim to visualize and study micro- and nanoscale structures with unprecedented detail and contrast. Furthermore, we explore routes towards optimization of extreme ultraviolet light production from laser-produced plasmas, using advanced optical methods and ultrafast laser technology.
You have an MSc-degree in Physics, Technical Physics or Electrical Engineering (or a related subject). A background in optics, imaging, (ultrafast) laser physics and/or high-harmonic generation is an advantage. Motivation for working with advanced laser systems, performing complex optical experiments, and working as part of a team are considered important. Good verbal and written communication skills (in English) are required.
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,441 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
Dr. Stefan Witte
Group leader EUV Generation and Imaging
Phone: +31 (0)20-8517110
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|Title||Two positions for PhD-students: Extreme ultraviolet lensless 3D imaging|
|Employer||Advanced Research Center for Nanolithography ARCNL|
|Job location||Science Park 110, 1098 XG Amsterdam|
|Published||March 3, 2021|
|Job types||PhD  |
|Fields||Electrical Engineering,   Electronics,   Image Processing  |